PhotonIcs and Electromagnetics Research Symposium,
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Published: 2015-07-09
Plasmonic Metalens Lithography Far beyond the Near Field Diffraction Limit
By
Yanqin Wang,
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    Yanqin Wang

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

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Ping Gao,
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    Ping Gao

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

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Yunfei Luo,
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    Yunfei Luo

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

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Xiangang Luo,
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    Xiangang Luo

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

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Changtao Wang,
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    Changtao Wang

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

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Na Yao,
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    Na Yao

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

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Zeyu Zhao
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    Zeyu Zhao

    Institute of Optics and Electronics, Chinese Academy of Sciences, China

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Progress In Electromagnetics Research, Vol. 185, 17-48, 2026
doi:10.2528/PIER26011404
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Abstract
We present a review of homogenization models of microwave wire media with different geometries. We begin with a simple (uniaxial) wire medium and then consider more complex types of wire media - double, triple, and interlaced wire media - which remain underexplored. We discuss boundary problems with wire media and the most important physical effects revealed using the reviewed homogenization models.
Citation
Yanqin Wang, Ping Gao, Yunfei Luo, Xiangang Luo, Changtao Wang, Na Yao, and Zeyu Zhao, "Plasmonic Metalens Lithography Far beyond the Near Field Diffraction Limit," Proceedings of 2026 Photonics & Electromagnetics Research Symposium, Suzhou, China, 27 - 31 July
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